Introduction
——WEIMAS provide total solutions for photoresist core materials, including Photo Acid Generator (PAG), BARC resin, PHS resin and Photo initiator(PI).
We have obtained over 10 core authorized patents on semiconductor lithography material and have applied for 30+ Chinese semiconductor lithography patents.
Professional, Reliable and Efficient are our values.
优质客户群
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2025
Hefei R&D Center officially opened and started delivery
Chinese(Hefei) Mass Production Base started operation and ISO9001 certified
Full coverage of Chinese semiconductor customers
Selected as a potential unicorn enterprise in China for 2025
Chinese(Hefei) Mass Production Base started operation and ISO9001 certified
Full coverage of Chinese semiconductor customers
Selected as a potential unicorn enterprise in China for 2025
2024
A total of nearly 20 Chinese customers have purchased
in multiple batches of more than 50 PAG products for ArFi/ArF/KrF photoresist
in multiple batches of more than 50 PAG products for ArFi/ArF/KrF photoresist
2023
Signed contracts with three major Chinese customers
Accumulated delivery of nearly 20 types of ArF/KrF PAG
Chinese R&D center went into operation
The Hefei Plant was approved for construction
Accumulated delivery of nearly 20 types of ArF/KrF PAG
Chinese R&D center went into operation
The Hefei Plant was approved for construction
2022
Sign for construction of Chinese(Hefei) Mass Production Base
Completed a strategic financing of 100 million RMB
Completed a strategic financing of 100 million RMB
2021
Suzhou Weimas established
Chinese HQ and R&D center established
2019
Mass Production for BARC resin
2018
Korean Mass Production Base(2nd Plant) completed
2017
Leading company in KrF PAG market
PSPI material development completed
Zr precursor launched
Zr precursor launched
2014
Korean R&D center established
2011
Korean Mass Production Base(1st Plant) completed
2002
Mass Production of KrF PAG
1999
Korean subsidiary established
Milestone
——Provide total solutions for photoresist core materials
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