Application:
Display Photoresists
WEIMAS is a leading supplier of core materials for high-end semiconductor photoresist. Our main products include Photo Acid Generator (PAG), BARC resin, PHS resin and Photo initiator (PI), which are the core materials for ArFi/ArF/KrF photoresists used in advanced semiconductor manufacturing process and photoresists in the display panel industry. Our technical specifications are all at the leading level in the industry, which can achieve ppb grade metal impurity control.
Core Products
Process Breakthrough
We provide total solutions for photoresist core materials
including both EUV level (5 - 7nm) and ArF/KrF level (14nm/0.35μm) etc,.
Industrial Layout
——
ppb-scale Metal purification
· Single Metal＜5ppb (32 kinds)
· Total Metal<20ppb
Ultrahigh-Purity Control
· Purity ＞99.5%
· Moisture<1000ppm
M.P.: (+86) 189-1558-6805
Email: ir@weimas.cc
TEL: 0512-60858818
Suzhou: Building 7, Xinhong Industrial Park, SIP, Suzhou, China
Hefei: No. 2666, Longzihu Road, Hefei Xinzhan High-tech Industrial Development Zone, Hefei, China
WEIMAS is a high-tech enterprise focused on R&D, mass production, and sales of photoresist core materials. We provide efficient and rapid R&D service and have successfully developed multiple products that meet client specifications.
Equipped with world-class instruments, R&D center and QC teams continuously innovate to deliver high-quality products, keep pace with evolving innovation demands, and share value outcomes with our customers.
HQ and R&D center
Add.: SIP, Suzhou
R&D Lab：2000m²
Equipped with ICP-MS and other international first-class testing equipment
Add.: SIP, Suzhou
R&D Lab：2000m²
Equipped with ICP-MS and other international first-class testing equipment
Korean Mass Production Base
Add.: Jecheon-city, Republic of Korea
Area：16100m²
20 years of mass production experience,
stable delivery to Japanese and Korean
PR customers
Add.: Jecheon-city, Republic of Korea
Area：16100m²
20 years of mass production experience,
stable delivery to Japanese and Korean
PR customers
Chinese(Hefei) Mass Production Base
Add.: Hefei Xinzhan High-tech Zone
Area：50 acres(25,500㎡)
R&D Lab: 2,500㎡
Cap.: 100T（PAG, PI, resin）
Add.: Hefei Xinzhan High-tech Zone
Area：50 acres(25,500㎡)
R&D Lab: 2,500㎡
Cap.: 100T（PAG, PI, resin）
Contact Us
Product Center
——PAG (Photo Acid Generator)
——Customized Products
——BARC Resin
——PI (Photo Initiator)
——Applications:
KrF, ArF, EUV, E - beam Photoresists
Application:
Photoresist & Advanced Packaging
Applications:
Bottom Anti-Reflective Coating
Core technology
——
Stable mass production
· Batch-to-batch stability
· Scale-Up Stability
Customerized capability
· 20 years experience of R&D on PAG
· Quick response to customer needs
Delivering high quality products through material innovation
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Quality Assurance
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